[seminar] Seminar na IF-u utorak 24.09.2019. u 11:00h - Ph.D. Mirko Vukovic

[Damir Dominko]

****

*Institut za fiziku, Bijenička cesta 46,*

*predavaonica u zgradi Mladen Paić*

**utorak, 24. 09. 2019. u 11:00 sati*
*
**
*Moore's law and the evolution of plasma etch equipment and process & 
impressions and recollections of applied physics research in 
semiconductor manufacturing-life lessons*
*Ph.D. Mirko Vukovic
*
*TEL Technology Center America, LLC, USA*
Driven by economic pressures which manifest themselves as Moore's law, 
over the past 35-40 years the transistor gate length has shrunk by a 
factor of 100 (from 3 micron to 30 nm), wafer size has increased by a 
factor of 4 (from 75 to 300 mm), the gate stack materials have changed 
(SiO₂ to HfOₓ gate) and geometry have changed as well (from planar to 
tri-gate). At the same time, the number of yielding transistors on a 
chip has gone from 30,000 into billions of billions.

How has the plasma etch chamber, chemistry, parameters, control changed 
during this time span to help produce billions of identical and 
functioning on a chip? And what do we expect of plasma etch equipment 
and process when transistor dimensional scaling stops, and we start 
stacking transistors vertically?

As a test case, this presentation will explore the evolution of the 
transistor gate and the gate etch equipment and process: how etch tools, 
chemistry, process uniformity and variability requirements, process 
control have evolved to faithfully etch billions of features to yield a 
functioning chip.

******Voditelji seminara IF-a: Ivan Balog <mailto:balog at ifs.hr> i Damir 
Dominko <mailto:ddominko at ifs.hr>**

-- 
Damir Dominko
Research associate
Institute of Physics Zagreb
Bijenicka cesta 46, 02-226
10000 Zagreb, Croatia
office: +385 1 469 8821
cell: +385958172990
e-mail: ddominko at ifs.hr

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