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<div style="color: rgb(0, 0, 0); font-family: "times new
roman", "new york", times, serif; font-size:
12pt; text-align: center;"><strong><b><span
style="font-size:16pt;color:black" lang="HR"><img
src="cid:part1.66E62A02.16F83513@ifs.hr"
data-mce-src="imap://ddominko@mail.ifs.hr:143/fetch%3EUID%3E/INBOX%3E40129?header=quotebody&part=1.1.2.2&filename=logo_IF_seminar.jpg"
class=""></span></b></strong></div>
<div style="color: rgb(0, 0, 0); font-family: "times new
roman", "new york", times, serif; font-size:
12pt; text-align: center;">
<p style="text-align:center;margin:0px" align="center"><b><span
style="font-family:'century gothic' ,
sans-serif;color:#5f5f5f" lang="EN-GB">Institut za fiziku,
Bijenička cesta 46,</span></b></p>
<p style="text-align:center;margin:0px" align="center"><b><span
style="font-family:'century gothic' ,
sans-serif;color:#5f5f5f" lang="EN-GB">predavaonica u
zgradi Mladen Paić</span></b></p>
<strong><b><span style="font-size:14pt;font-family:'century
gothic' , sans-serif;color:#993300" lang="EN-GB">utorak,
24. 09. 2019. u 11:00 sati</span></b><br>
</strong></div>
<div style="color: rgb(0, 0, 0); font-family: "times new
roman", "new york", times, serif; font-size:
12pt; text-align: center;"><strong></strong> </div>
<div style="text-align: center;"><span style="color: rgb(85, 145,
60); font-family: "times new roman", serif;
font-size: 12pt;"><span style="font-size:21.3333px"><b><font
face="times new roman, serif">Moore's law and the
evolution of plasma etch equipment and process &
impressions and recollections of applied physics
research in semiconductor manufacturing-life lessons</font></b></span></span><font
face="times new roman, serif" color="#55913c"><span
style="font-size: 21.3333px;"></span></font></div>
<div style="text-align: center;"><font face="century gothic,
sans-serif"><span style="font-size: 18.6667px;"><b>Ph.D. Mirko
Vukovic<br>
</b></span></font></div>
<div style="color: rgb(0, 0, 0); font-family: "times new
roman", "new york", times, serif; font-size:
12pt; text-align: center;"> </div>
<div style="text-align: center;">
<div style="text-align: center;"><font face="century gothic,
sans-serif"><span style="font-size: 14.6667px;"><b>TEL
Technology Center America, LLC, USA</b></span></font>
</div>
</div>
<div style="color: rgb(0, 0, 0); font-family: "times new
roman", "new york", times, serif; font-size:
12pt; text-align: center;"><span
style="font-size:small;font-family:'arial'"></span> </div>
Driven by economic pressures which manifest themselves as Moore's
law, over the past 35-40 years the transistor gate length has
shrunk by a factor of 100 (from 3 micron to 30 nm), wafer size has
increased by a factor of 4 (from 75 to 300 mm), the gate stack
materials have changed (SiO₂ to HfOₓ gate) and geometry have
changed as well (from planar to tri-gate). At the same time, the
number of yielding transistors on a chip has gone from 30,000 into
billions of billions.<br>
<br>
How has the plasma etch chamber, chemistry, parameters, control
changed during this time span to help produce billions of
identical and functioning on a chip? And what do we expect of
plasma etch equipment and process when transistor dimensional
scaling stops, and we start stacking transistors vertically?<br>
<br>
As a test case, this presentation will explore the evolution of
the transistor gate and the gate etch equipment and process: how
etch tools, chemistry, process uniformity and variability
requirements, process control have evolved to faithfully etch
billions of features to yield a functioning chip. <br>
<br>
</div>
<b><span style="font-size:12pt;font-family:'century gothic' ,
sans-serif" lang="EN-GB"><b><span
style="font-size:11pt;font-family:'century gothic' ,
sans-serif" lang="EN-GB"> </span></b></span></b><b><span
style="font-size:12pt;font-family:'century gothic' , sans-serif"
lang="EN-GB"><b><span style="font-size:11pt;font-family:'century
gothic' , sans-serif" lang="EN-GB">Voditelji seminara IF-a:
<a href="mailto:balog@ifs.hr">Ivan Balog</a> i <a
href="mailto:ddominko@ifs.hr">Damir Dominko</a></span></b></span></b>
<pre class="moz-signature" cols="72">--
Damir Dominko
Research associate
Institute of Physics Zagreb
Bijenicka cesta 46, 02-226
10000 Zagreb, Croatia
office: +385 1 469 8821
cell: +385958172990
e-mail: <a class="moz-txt-link-abbreviated" href="mailto:ddominko@ifs.hr">ddominko@ifs.hr</a></pre>
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